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Ways To Reduce The Cost Of Depositing Precious Metals

28. Juli 2020 | Verfasser: KJLC Blog

A common question from our materials customers is how they can reduce the cost of depositing precious metals. Our Materials Product Manager, Katie McGough recommends some of the ways you can avoid overspending unnecessarily on precious metals such as through using a reclaim service or using thinner targets.

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Schlagwörter:
Vakuumwissenschaft Depositionsmaterialien



KJLC® Deposition System Restart Procedure

8. Juli 2020 | Verfasser: KJLC Blog

After an extended shut-down it may be time to re-start your Kurt Lesker built thin film deposition system. A detailed re-start procedure for systems equipped with our eKLipse control software can be found below. This procedure provides a detailed description of the steps required to safely return our deposition systems to full operation.

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Schlagwörter:
Systeme Vakuumwissenschaft



Tips For Thermally Evaporating Aluminum

16. Juni 2020 | Verfasser: KJLC Blog

By far one of the most common questions that we receive from various users is how to thermally evaporate Aluminum. Aluminum is very commonly evaporated for various applications and can be somewhat problematic. Through some internal experience and through with working with various customers, we recommend two ways to approach thermal evaporation of aluminum.

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Schlagwörter:
Vakuumwissenschaft Depositionsmaterialien Depositionsverfahren



Equivalent Oxide Thickness (EOT) Scaling with Hafnium Zirconium Oxide High-K Dielectric from a Surprising Boost in Permittivity

1. Juni 2020 | Verfasser: KJLC Innovate

Dr. Kai Ni from the research group of Professor Suman Datta, Stinson Professor of Nanotechnology at the University of Notre Dame, in collaboration with Purdue University and Kurt J. Lesker Company recently developed conformal atomic layer deposition (ALD) based hafnium zirconium oxide thin film processes displaying excellent electrical properties for potential gate oxide complement or replacement in scaled logic and memory technology nodes. The findings were recently published and showcased in the IEEE International Electron Devices Meeting (IEDM) 2019 in San Francisco, CA [ref. 1]. In particular, hafnium zirconium oxide (HfxZr1-xO2, or HZO) has emerged as a ferroelectric (large charge density per unit area) material system that also displays a tunable permittivity or dielectric constant (charge response) depending on the concentration of Zr added to the base HfO2 oxide. The reported films indicate that by sweeping the concentration of Zr in HfO2 during the ALD growth, a substantial boost in the dielectric constant can be observed around 70% Zr concentration due to the presence of a crystallographic phase transition of the underlying HZO material structure, which results in enhanced electrical performance even in ultrathin films 25Å thick [ref. 2]. These findings elucidate the necessity and importance of extremely stringent deposition process control along with corresponding electrical and structural characterization for the understanding of new materials systems for their further implementation in commercial applications such as high-performance digital and analog CMOS technology at advanced nodes.

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Schlagwörter:
INNOVATE Systeme Vakuumwissenschaft Depositionsverfahren



Durability of Automotive Exhaust Systems Enhanced by Heat Treatment in High Vacuum

1. Mai 2020 | Verfasser: KJLC Blog

In a recently issued patent (US 10.619.950 14. April 2020) researchers at the Toyota Motor Company have demonstrated that the corrosion resistance of stainless steel exhaust systems for cars and trucks can be substantially improved by heat treatment in high vacuum. Stainless steel is a complex metal alloy of iron, nickel, chrome and other elements. It is known to be a very durable metal but even this robust material can be corroded by exposure to chloride ions, sulfuric and hydrochloric acids, soot and other artifacts of the exhaust from an internal combustion engine. Reaction with these aggressive gases causes pits in steel which eventually lead to premature failure. The use of low-grade fuels speeds the degradation of exhaust systems.

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Schlagwörter:
INNOVATE Systeme Vakuumwissenschaft Depositionsverfahren



Why Did My Bond Melt?

21. April 2020 | Verfasser: KJLC Blog

As a Product Manager in the Materials Division, I field a lot of questions from customers from many different industries with varying degrees of sputtering experience. One of the more common emails that I receive goes something along the lines of, "There's something wrong with my bonding because the indium has melted out of the sides of my target." Often times the user has waited for their target, spent money on it, only to use it one time and had to stop due to the melted bond. A frustrating situation for sure.

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Schlagwörter:
Vakuumwissenschaft Depositionsmaterialien Depositionsverfahren



Deposition System Shut Down & Storage

18. März 2020 | Verfasser: KJLC Blog

In these uncertain times, with many people needing to leave their labs for an extended period, it makes sense to review basic shut down procedures for thin film deposition systems. A comprehensive approach to system shutdown may reduce the number of issues related to the eventual re-start. At the Lesker Company we have a team of highly skilled engineers available to assist.

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Schlagwörter:
Systeme Vakuumwissenschaft



3D Deposition of Conformal Lead-Based Ferroelectric & Piezoelectric Thin Films by Atomic Layer Deposition

6. März 2020 | Verfasser: KJLC Innovate

Dr. Nicholas A. Strnad (General Technical Services, LLC) in collaboration with the U.S. Army Combat Capabilities Command Army Research Laboratory and the University of Maryland, College Park have recently developed conformal processes for a variety of lead-based electronic materials with outstanding properties using atomic layer deposition (ALD)...

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Schlagwörter:
INNOVATE Systeme Vakuumwissenschaft Depositionsverfahren



The Effect of Sputter Cathode Design on Deposition Parameters: Design Enhancements Expand Capabilities for the Magnetron Sputtering of Thin Films

22. Juli 2019 | Verfasser: KJLC Innovate

Sputtering is a relatively mature approach for the deposition of a variety of thin film materials. Initial publications on the process date to the early 1800s. In its simplest form sputtering provides a route to manufacture high quality reflective coatings for mirrors and potato chip bags; and at the extreme end, for creating the most advanced semiconductor computing devices in the world.

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Schlagwörter:
INNOVATE Systeme Vakuumwissenschaft Depositionsverfahren



A Positive Kick Enhances the High Power Impulse Magnetron Sputter Process

15. März 2019 | Verfasser: KJLC Innovate

High impulse power magnetron sputtering, either HIPIMS or HiPMS, was first reported in 1999 by Dr. Vladimir Kouznetsov, et al. from Linköping University’s Department of Physics. HIPIMS is distinct from classical direct current magnetron sputtering, or dcMS, because it utilizes a rapid series of pulses at very high voltage, on the order of 2000V, and high current density approaching 10A/cm2. In addition, HIPIMS also exhibits some degree of self-sputtering, where sputter target adatoms are ionized with some recycling of process gas and ionized target material to the surface of the target.

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Schlagwörter:
INNOVATE Vakuumwissenschaft



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