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Enhancing the Surface Properties & Functionalization of Polymethyl Methacrylate with Atomic Layer Deposited Titanium (IV) Oxide

7. Juni 2021 | Verfasser: KJLC Innovate

Mina Shahmohammadi from the research group of Professor Christos G. Takoudis, Full Professor in the Departments of Bioengineering and Chemical Engineering at the University of Illinois at Chicago, in collaboration with College of Dentistry, University of Illinois at Chicago, and Kurt J. Lesker Company recently developed conformal atomic layer deposition (ALD) based titanium (IV) oxide (TiO2) thin film processes on Polymethyl Methacrylate (PMMA) displaying excellent surface and mechanical properties for potential engineering, medical, and biomedical applications. The findings were recently published in the Journal of Materials Science.

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