Production Vacuum Systems
Magnetron Sputtering Sources
Up to 7 linear cathodes
- 5" x 15"
- 5" x 17"
- 5" x 24"
Up to 4 linear cathodes
- 5" x 15"
- 5" x 17"
- 5" x 24"
- 5" x 30"
Platen / Deposition Zone
Overall Drum = 30,5" OD x ≈21" LG
- 1.440 sq/in
- Heating, Cooling, Bias, Removable Panels
- Single and Dual Axis Rotation For 3D Components
- Ion Etch Option
Any Sized Substrate That Fits Within Pallet Area
- 12" x 12"
- 20" x 20"
- 26,5" x 30"
- Options for RF Bias, Heat over Etch, Backside Cooling
Schleusenkammer
nicht verfügbar
Dual pallet Standard
Options for Heat and Five Pallet Stacker
Software
Full eKLipse™ Control Software/Hardware Suite
Allen Bradley 'i' PLC with Full Automated Software Control
BATCH CoatersKJLC Linear Batch Coaters, and Multi Substrate Dome Coaters for Mid-Level Throughput Applications
Weitere InfosMagnetron Sputtering Sources
Up to 7 linear cathodes
- 5" x 15"
- 5" x 17"
- 5" x 24"
Platen / Deposition Zone
Overall Drum = 30,5" OD x ≈21" LG
- 1.440 sq/in
- Heating, Cooling, Bias, Removable Panels
- Single and Dual Axis Rotation For 3D Components
- Ion Etch Option
Schleusenkammer
nicht verfügbarSoftware
Full eKLipse™ Control Software/Hardware Suite
KDF In-Line SolutionsVertical and Horizontal Batch Coaters for Mainstream Silicon, Emerging Materials and Flat Panel Display Markets
Weitere InfosMagnetron Sputtering Sources
Up to 4 linear cathodes
- 5" x 15"
- 5" x 17"
- 5" x 24"
- 5" x 30"
Platen / Deposition Zone
Any Sized Substrate That Fits Within Pallet Area
- 12" x 12"
- 20" x 20"
- 26,5" x 30"
- Options for RF Bias, Heat over Etch, Backside Cooling
Schleusenkammer
Dual pallet StandardOptions for Heat and Five Pallet Stacker