Ultra High Vacuum Systems


Ultrahochvakuum
Fully Bakeable
nicht verfügbar
Magnetron Sputtering Sources
12
6+
Elektronenstrahlquelle
nicht verfügbar
Multi Pocket, 5 kW or 10 kW Power Supplies
Platen
150 mm Substrates
- Heating Up to 1000°C
- Water-Cooling
- RF Bias
200 mm Substrates
- Heating Up to 1100°C
- Water-Cooling
- RF Bias
Schleusenkammer
Single or Multi-Cassette
Single or Multi-Cassette
Software
Full eKLipse™ Control Software/Hardware Suite
Full eKLipse™ Control Software/Hardware Suite
Ultrahochvakuum
Fully BakeableMagnetron Sputtering Sources
12Elektronenstrahlquelle
nicht verfügbarPlaten
150 mm Substrates
- Heating Up to 1000°C
- Water-Cooling
- RF Bias
Schleusenkammer
Single or Multi-CassetteSoftware
Full eKLipse™ Control Software/Hardware Suite
CMS (Combinatorial Materials Science) SeriesAdvanced Research System Utilizing Sputtering or Electron Beam Techniques
Weitere InfosUltrahochvakuum
nicht verfügbarMagnetron Sputtering Sources
6+Elektronenstrahlquelle
Multi Pocket, 5 kW or 10 kW Power SuppliesPlaten
200 mm Substrates
- Heating Up to 1100°C
- Water-Cooling
- RF Bias